D265 Borosilicate Optical Glass Carrier Platform Low Autofluorescence High Flatness Chemical Resistant

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Borosilicate Optical Glass Carrier Platform

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Low Autofluorescence Quartz Glass Plate

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High Flatness Quartz Glass Plate

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Product Description

1. Basic Product Information

Product Name: D265 Low Autofluorescence High Flatness Borosilicate Glass Carrier Platform Base Material: Grade 1 high hydrolytic resistance D265 borosilicate optical glass Processing Technology: Double-sided optical polishing, precision grinding chamfering, ultra-clean cleaning Standard Optional Sizes: Custom square or round shapes; standard thickness 0.17–1.2mm, flatness ≤2μm, TTV total thickness variation ≤1μm

2. Main Applications

Precision monolithic machined from special low-alkali D265 borosilicate glass, this carrier features ultra-low autofluorescence, high light transmittance, acid & alkali resistance, low thermal expansion and superior flatness. It is widely used as a carrier substrate for microscopic observation, semiconductor temporary bonding, biological testing, optical lithography and precision laboratory equipment.

3. Core Advantages (vs Ordinary Borosilicate/Float Glass Carriers)

Ultra-low autofluorescence: Low-alkali D265 formula minimizes background fluorescence, eliminating stray light interference for fluorescence microscopy; Superior chemical stability: Top-grade hydrolytic resistance withstands long-term erosion of organic solvents, weak acids and alkalis with zero ion precipitation; Low thermal expansion & thermal stability: CTE matched with silicon wafers, resistant to warpage and cracking under temperature cycling and high-temperature processes; Excellent optical transmittance: High UV & visible light transmission with zero chromatic aberration, compatible with optical observation, laser and UV debonding processes; Ultra-precise flatness: Double-sided high-precision polishing with tightly controlled flatness and thickness tolerance, meeting micron-level precision requirements for semiconductors and precision optics; Low alkali & contamination-free: Low alkali content prevents cell damage and contamination of wafers/high-purity reagents, perfect for high-cleanliness manufacturing processes.