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180×15×5mm High Purity Quartz Substrate With High Temperature Resistance

  • 180×15×5mm High Purity Quartz Substrate With High Temperature Resistance
  • 180×15×5mm High Purity Quartz Substrate With High Temperature Resistance
  • 180×15×5mm High Purity Quartz Substrate With High Temperature Resistance
Place of Origin China
Model Number QT-SB-180x15x5
Price Negotiable
Product Details
Material High Purity Fused Silica (SiO2 > 99.99%) Dimensions 180mm X 15mm X 5mm (L X W X T)
Max Operating Temperature 1100°C Surface Finish Precision Ground & Polished
Thermal Expansion Coefficient 5.5 X 10^-7 /°C (Ultra-Low CTE) Chemical Resistance Hydrofluoric Acid, Strong Acid & Alkali
Transmittance > 92% (UV-Visible Range) Metal Impurity Ultra-Low, No Precipitation
Application Semiconductor Wafer Coating, Optical Film Substrate, PV Cell Fixture, Lab Corrosion Platform
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high purity quartz substrate

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180×15×5mm quartz substrate

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High temperature resistance quartz substrate
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Product Description

Product Overview

The High Purity Fused Silica Quartz Substrate is a precision-ground quartz glass plate (180mm x 15mm x 5mm) designed for high-end semiconductor, optical coating, photovoltaic, and laboratory applications. Manufactured from premium fused silica (SiO2 > 99.99%), this substrate delivers exceptional thermal stability, chemical inertness, and optical clarity — making it the preferred choice for demanding high-precision manufacturing environments.

Key Features

  • Ultra-High Purity: SiO2 > 99.99% with ultra-low metal impurity content. No ion precipitation ensures contamination-free processing for semiconductor and optical applications
  • 1100°C Temperature Resistance: Withstands extreme heat without deformation or degradation, far surpassing borosilicate glass alternatives
  • HF & Strong Corrosive Resistance: Excellent chemical durability against hydrofluoric acid, strong acids, and alkalis — ideal for aggressive wet chemical processes
  • Ultra-Low Thermal Expansion: CTE of 5.5 x 10^-7 /°C prevents cracking and warping under rapid temperature cycling
  • High Transmittance: > 92% transmission across UV to visible spectrum, perfect for optical coating and photolithography applications
  • Precision Surface Finish: Precision ground and polished surfaces ensure flatness and uniform coating deposition

Applications

IndustryApplication
Semiconductor & MicroelectronicsWafer packaging carrier, lithography substrate, high-temperature coating base, electronic component aging test platform
Optics & PhotoelectricOptical thin film coating substrate, filter plate base, vacuum coating fixture, spectrum test bench
PV & New EnergySolar cell coating fixture, high-temperature diffusion & PECVD process carrier, anti-deformation substrate
Lab & Fine ChemicalHigh-temperature sintering platform, HF corrosion test bench, strong chemical reaction carrier
Precision InstrumentSpectrometer reference substrate, optical inspection equipment bench plate

Competitive Advantages

vs. Borosilicate Glass: Withstands over 1100°C vs ~500°C limit; superior HF acid resistance; 10x lower thermal expansion prevents cracking; ultra-low metal impurity eliminates process contamination risk

vs. Alumina Ceramic: High optical transparency for UV-visible applications; smoother surface finish for uniform coating; lighter weight and easier precision machining

Specifications

ParameterValue
MaterialHigh Purity Fused Silica (SiO2 > 99.99%)
Dimensions180mm (L) x 15mm (W) x 5mm (T)
Max Operating Temperature1100°C
CTE5.5 x 10^-7 /°C
Transmittance> 92% (UV-Visible)
Chemical ResistanceHF, Strong Acid & Alkali
Surface FinishPrecision Ground & Polished
Metal ImpurityUltra-Low, No Precipitation
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