Smooth Fused Quartz Substrate Conical Cavity For Optical Sample Analysis

Product Overview

The Quartz Substrate with Conical Cavity (base 2mm x 2mm with center tapered pit) is a high-precision optical-grade quartz component designed for micro-sample positioning, optical testing, and semiconductor experimentation. Precision machined from high-purity fused silica (SiO2 > 99.99%) with a smooth, chip-free cone recess, it delivers exceptional thermal stability up to 1100°C, outstanding chemical resistance to HF and aggressive reagents, and zero ion leaching — making it the ideal platform for the most demanding micro-scale optical and semiconductor applications.

Key Features

• Precision Conical Cavity: Center tapered pit with smooth, chip-free finish for secure micro-sample placement and positioning
• 1100°C High Temperature Resistance: Maintains dimensional stability and surface quality under extreme thermal conditions without deformation
• HF & Strong Chemical Resistance: Unaffected by hydrofluoric acid, concentrated acids, strong alkalis, and organic solvents
• Low Thermal Expansion: CTE 5.5 x 10^-7/°C ensures stable dimensions and cavity geometry across wide temperature ranges
• High Purity & Zero Ion Leaching: SiO2 > 99.99% with no metal ion precipitation, preventing sample contamination
• Precision Machining: Fine-polished surface with exact dimensional tolerances for repeatable optical alignment

Applications

Competitive Advantages

vs. Plastic/Polymer Substrate: Plastics swell and degrade in organic solvents and cannot withstand high temperatures; this quartz substrate resists all solvents and acids, withstands 1100°C, and can be repeatedly cleaned and reused without degradation

vs. Borosilicate Glass Substrate: Borosilicate glass softens above 500°C and is attacked by HF; quartz substrate maintains integrity at 1100°C and is fully resistant to hydrofluoric acid and all corrosive media

Specifications