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High Purity Fused Silica Quartz Tank Uniform Wall HF Resistant For Wafer Pickling Chemical Digestion Laboratory Reactor
| Material | High Purity Fused Silica | Construction | Integrally Fused Or Bonded |
|---|---|---|---|
| Surface | Double Side Fine Ground, Smooth Inner Wall | Temperature Resistance | ≤1100°C Continuous Working |
| Chemical Resistance | HF And Concentrated Strong Acid/Alkali Resistant | ||
| Highlight | High Purity Quartz Tank,Fused Silica Quartz Tank,Wafer Pickling Quartz Tank |
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High Purity Fused Silica Quartz Tank
This high purity fused silica quartz tank features uniform wall thickness, double side fine ground surfaces and integrally fused or bonded construction. With ≤1100°C continuous working temperature and superior HF/strong acid chemical durability, it delivers reliable performance for semiconductor wafer pickling, high-temperature sample digestion, chemical reagent reactions and laboratory open calcination—significantly outperforming borosilicate glass alternatives.
Product Parameters
| Parameter | Specification |
|---|---|
| Material | High Purity Fused Silica |
| Construction | Integrally Fused or Bonded |
| Wall Thickness | Uniform |
| Surface Finish | Double Side Fine Ground, Smooth Inner Wall |
| Working Temperature | ≤1100°C Continuous |
| Chemical Resistance | HF and Concentrated Strong Acid/Alkali Resistant |
| Thermal Expansion | Low, Resistant to Rapid Heating and Cooling |
| Purity | High Purity, No Heavy Metal Precipitation |
Key Features
- HF & Strong Chemical Resistance – Fully resistant to hydrofluoric acid and concentrated strong acids/alkalis, suitable for prolonged immersion of corrosive reagents that would destroy borosilicate glass tanks.
- ≤1100°C Continuous Operation – Maintains structural integrity under sustained high temperatures for digestion, calcination and high-temperature chemical processes without softening or deformation.
- High Purity, No Contamination – 99.99% pure fused silica with zero heavy metal precipitation, ensuring no cross-contamination during semiconductor wafer processing and high-purity chemical applications.
- Low Thermal Expansion – Excellent thermal shock resistance withstands rapid heating and cooling cycles without cracking, enabling repeated cyclic use in demanding laboratory and industrial environments.
- Smooth Inner Wall – Precision polished interior surface for easy cleaning and minimal residue adhesion, reducing cross-contamination risk between batches.
Applications
1. Wet Acid Pickling
Acid immersion tank for photovoltaic, optical glass and semiconductor wafer pickling and cleaning processes, with full HF and acid resistance ensuring reliable long-term operation.
2. High-Temperature Digestion
Sample digestion and evaporation container for chemical analysis, environmental testing and laboratory assays, withstanding sustained heating and corrosive digestion reagents.
3. Chemical Small-Scale Production
Corrosive reagent reaction, purification and temporary storage tank for chemical pilot-scale testing, with inert quartz construction preventing unwanted side reactions.
4. Laboratory Sintering
Open calcination container for powder raw materials in laboratory electric furnaces, with high-temperature stability and non-contaminating construction for repeatable experimental results.
Advantages over Borosilicate Glass
Unlike borosilicate glass tanks attacked by HF and softened at high temperatures, this fused silica quartz tank offers full HF resistance, sustained 1100°C operation, excellent thermal shock resistance for cyclic use, and high purity without heavy metal precipitation—making it the definitive choice for semiconductor wafer processing, high-temperature digestion and corrosive chemical applications.

