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36x32x580mm High Purity Quartz Instrument Heat Resistance Acid Alkali Proof For Lab Distillation Purification
Product Details
| Material | High Purity Fused Silica (SiO2 > 99.99%) | Dimensions | 36mm X 32mm X 580mm |
|---|---|---|---|
| Max Operating Temperature | 1100°C | Chemical Resistance | HF, Strong Acid & Alkali, Organic Solvents |
| Thermal Shock Resistance | Excellent, Low CTE 5.5 X 10^-7 /°C | Transmittance | UV-Visible Range |
| Purity | No Metal Ion Precipitation | Application | Lab Distillation, Fine Chemical Purification, Semiconductor Pretreatment, Environmental Digestion |
| Highlight | 36x32x580mm quartz instrument,high purity quartz instrument,Chemical Purification quartz instrument |
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Product Description
Product Overview
The High Purity Quartz Instrument (36mm x 32mm x 580mm) is a versatile quartz glass vessel engineered for demanding chemical, semiconductor, and environmental applications. Manufactured from premium fused silica (SiO2 > 99.99%), it delivers exceptional thermal stability up to 1100°C, outstanding chemical inertness against HF and strong corrosive media, and zero metal ion precipitation — making it the preferred choice for high-purity chemical processing and analytical workflows.
Key Features
- 1100°C High Temperature Resistance: Suitable for direct flame and electric heating; maintains structural integrity under extreme thermal conditions without deformation
- Strong Acid & Alkali Resistance: Outstanding chemical durability against hydrofluoric acid, concentrated acids, strong alkalis, and organic solvents
- High Purity Without Metal Precipitation: SiO2 > 99.99% with zero ion leaching, preventing sample contamination in sensitive analytical and purification processes
- Excellent Thermal Shock Resistance: Low thermal expansion coefficient prevents cracking during rapid heating-cooling cycles, far superior to borosilicate glass
- High Transmittance: Excellent optical clarity across UV-visible range for visual monitoring of reactions and processes
Applications
| Industry | Application |
|---|---|
| Laboratory Chemistry | High-temperature distillation and reflux reaction container for HF and concentrated acid/alkali reagents under direct flame or electric heating; used for material purification and physicochemical analysis |
| Fine Chemical & New Materials | Wet synthesis and acid pickling purification vessel for high-purity raw materials; prevents metal impurity doping to ensure final product purity |
| Semiconductor Industry | Electronic-grade reagent distillation and precursor raw material pretreatment container; meets ultra-clean manufacturing requirements for electronic materials |
| Environmental Testing | High-temperature digestion cell for waste gas and liquid sample pre-processing; corrosion-resistant against aggressive digestion reagents |
Competitive Advantages
vs. Borosilicate Glass Instrument: Withstands hydrofluoric acid and continuous operation at 1100°C vs ~500°C limit; excellent thermal shock resistance prevents cracking under rapid temperature changes; ultra-high purity eliminates ion precipitation and sample contamination
vs. PTFE/Teflon Instrument: Suitable for high-temperature applications where PTFE softens above 260°C; transparent wall enables visual process monitoring; rigid structure maintains dimensional stability under thermal cycling
Specifications
| Parameter | Value |
|---|---|
| Material | High Purity Fused Silica (SiO2 > 99.99%) |
| Dimensions | 36mm x 32mm x 580mm |
| Max Operating Temperature | 1100°C |
| Chemical Resistance | HF, Strong Acid & Alkali, Organic Solvents |
| Thermal Shock Resistance | Excellent, Low CTE 5.5 x 10^-7 /°C |
| Transmittance | UV-Visible Range |
| Purity | No Metal Ion Precipitation |
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