Quartz End Capped Tube OD43xWall3xL495mm High Purity One End Hermetically Sealed For Tube Furnace CVD Precursor

Quartz End-Capped Tube OD43*Wall3*L495mm

This quartz end-capped tube, sized OD43mm with 3mm wall thickness and 495mm total length, features one end integrally fused and hermetically sealed for leak-proof operation. Manufactured from high purity quartz, it delivers 1100°C heat resistance and superior HF/strong acid chemical durability—ideal for tube furnace sintering, wet chemical reactions, semiconductor CVD precursor storage, gas bubbling and laboratory sealed high-temperature reactions.

Product Parameters

Key Features

• Integrally Fused Hermetic End Cap – One end permanently fused during manufacturing to form a seamless, leak-proof closure with no joints or adhesives that could fail under high-temperature operation.
• 1100°C Heat Resistance – Maintains structural integrity and dimensional stability under sustained high-temperature sintering conditions in tube furnace and CVD applications.
• HF & Strong Chemical Resistance – Superior to borosilicate glass, withstands hydrofluoric acid and concentrated acids/alkalis for sealed corrosive reaction and wet chemical processing.
• High Purity, No Contamination – 99.99% pure quartz with zero metal impurity precipitation, critical for semiconductor-grade precursor storage and high-purity material processing.
• Excellent Thermal Shock Resistance – Resists cracking under rapid heating and cooling cycles, ensuring reliable long-term service in cyclic high-temperature operations.

Applications

1. Laboratory High-Temperature Sintering

Sealed reaction tube for tube electric furnace operations. Samples placed at the sealed end undergo calcination under protective gas atmosphere, completely isolated from ambient air and impurities.

2. Chemical Wet Bubbling Reaction

Sealed liquid reservoir bubbling container where inert gas passes through reagent liquid to generate bubbles—used for reagent humidification, raw material deoxidation and gas-liquid reaction processes.

3. Semiconductor & New Materials

High-purity precursor raw material sealed storage vessel. After high-temperature vaporization, carrier gas transports precursor vapor for CVD thin-film coating gas source supply with zero contamination.

4. Corrosive Liquid Sealed Reaction

Leak-proof container for HF acid and concentrated corrosive liquid reactions. Hermetically sealed to prevent leakage with no impurity precipitation that could contaminate test samples.

Advantages over Borosilicate Glass

Compared to borosilicate glass tubes, this quartz end-capped tube offers full HF acid resistance, sustained 1100°C operation, integrally fused end cap with superior sealing performance, excellent thermal shock resistance to prevent cracking, and high purity construction suitable for high-purity sealed material processing—making it the definitive choice for demanding semiconductor, chemical and laboratory applications.