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Optical Quartz Glass
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Machining Quartz Glass
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Quartz Glass Tube
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Quartz Capillary Tube
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Borosilicate Glass Tube
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Quartz Glass Rod
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Laser Spare Parts
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Silicon Dioxide Sputtering Target
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Quartz Apparatus
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Quartz Glass Plate
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Custom Glass Parts
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Custom Ceramic Parts
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Optical Manufacturing Equipment
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Mobile Glass Cover Making Machine
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Optical Measuring Instrument
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Optical Crystal
Circular Custom Glass Parts Fused Quartz Substrate With Six Bottom Surface Bosses
| Material | Fused Quartz | Diameter | 15mm |
|---|---|---|---|
| Shape | Circular | Bottom Bosses | 6 Positioning Protrusions |
| Surface Finish | Double-Sided Fine Grinding | Feature | Bosses Lift Substrate Off Carrier |
| Highlight | Circular Fused Quartz Substrate,Custom Fused Quartz Substrate,Fused Quartz Glass Substrate |
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Circular Custom Glass Parts Fused Quartz Substrate With Six Bottom Surface Bosses
This circular fused quartz substrate features six precisely machined bottom surface bosses, engineered for semiconductor and optical thin-film processing. With a compact 15mm diameter and double-sided fine grinding, the integral boss structure lifts the substrate off the carrier surface, eliminating contact-area contamination and ensuring uniform coating performance.
Product Parameters
| Parameter | Specification |
|---|---|
| Material | Fused Quartz |
| Diameter | 15mm |
| Shape | Circular |
| Bottom Bosses | 6 Positioning Protrusions |
| Boss Height Consistency | Precision Machined, Equal Height |
| Surface Finish | Double-Sided Fine Grinding |
| Temperature Resistance | High Temperature Resistant |
| Chemical Resistance | Acid and Alkali Resistant |
| Stress Level | Low Stress |
| Flatness | Excellent Flatness |
Key Features
- Integral Precision Machining – Six bottom bosses machined from a single fused quartz blank, ensuring consistent boss height and positional accuracy for reliable substrate performance.
- Bosses Lift Structure – Protruding bosses create a gap between substrate and carrier, preventing adhesive contact, liquid pooling, and uneven coating during deposition processes.
- Double-Sided Fine Grinding – Both top and bottom surfaces precision-ground for superior flatness, ensuring uniform thin-film deposition across the entire substrate area.
- High Temperature & Chemical Resistance – Fused quartz material withstands high-temperature processing environments and resists standard semiconductor cleaning chemicals without degradation.
- Low Stress & Stability – Minimal internal stress with excellent dimensional stability, maintaining precision tolerances through repeated thermal cycling.
Applications
1. Semiconductor Coating
Chip and wafer coating carrier substrate. The six bottom bosses suspend the substrate above the carrier plate, ensuring uniform film deposition without adhesion to the base plate—improving process yield and repeatability.
2. Optical Evaporation
Vacuum coating fixture pad for optical components. The boss structure prevents bottom surface scratching and residual liquid accumulation, maintaining optical surface quality during multi-layer coating processes.
3. Laboratory High-Temperature Sintering
Powder specimen support platform for high-temperature sintering. The ventilated gap created by the bosses promotes even heat distribution across the sample, preventing localized overheating.
4. Optoelectronic Component Packaging
Precision bonding and positioning substrate for optoelectronic components. The boss protrusions serve as adhesive-limiting boundaries, controlling bond line thickness for consistent assembly quality.
Advantages over Flat Substrates
Compared to conventional flat substrates, the six-boss elevated structure prevents full-surface contact with the carrier plate. This eliminates coating blind spots, reduces workpiece adhesion and sticking, and significantly improves production yield. Combined with fused quartz's superior resistance to process chemicals and high temperatures, this substrate delivers reliable performance for demanding semiconductor and optical manufacturing environments.

